Pure Chromium Metal Chromium Sputtering/Sputtering Targets

Chromium Sputtering Target Properties  Molecular Weight52AppearanceSilveryMelting Point1857°CBoiling Point2672°CDensity7.18 g/cm3Solubility in H2ON/AElectrical Resistivity12.9 microhm-cm @ 0°CElectronegativity1.6 PaulingsHeat of Vaporization72.97 K-cal/gm atom at 2672°CPoisson\'s Ratio0.21Specific Heat0

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Chromium Sputtering Target Properties 

 
Molecular Weight52
AppearanceSilvery
Melting Point1857°C
Boiling Point2672°C
Density7.18 g/cm3
Solubility in H2ON/A
Electrical Resistivity12.9 microhm-cm @ 0°C
Electronegativity1.6 Paulings
Heat of Vaporization72.97 K-cal/gm atom at 2672°C
Poisson's Ratio0.21
Specific Heat0.107 Cal/g/K @ 25°C
Tensile StrengthN/A
Thermal Conductivity0.939 W/cm/K @ 298.2 K
Thermal Expansion(25 °C) 4.9 µm·m-1·K-1
Vickers Hardness1060 MN m-2
Young's Modulus279 GPa
 

COMPANY PROFILE:

Since 2014

Specializing in high purity sputtering targets.

Leader manufacturer of sputtering materials in China.

Qualified the world certificates such as ISO9001:2008 and SGS.

Comprehensive in R&D, manufacturing, and sales on thin film materials.

Export to more than 15 countries in Europe, Southeast Asia, South America and areas, etc.

Pure Chromium Metal Chromium Sputter/Sputtering Target

OUR PRODUCTS     

*Metal Target : W, Mo, Ta, Nb, Cu, V, Ni, Ti, Fe, Al ,Zr, Co, Au, Ag, Pt, etc.

*Alloy Target : NiFe, NiCr, NiV, CuNi,TiAl, CoCr, CoFe, WTi, CoTaZr,CuInGa, ZnSn, CuZn, etc

*Ceramic Target : TiO2,Al2O3,Ta2O5, ZrO2,SiC,SiO,SiO2, ITO, GZO, AZO, WS2, MoS2,Ga2O3,HfO2,etc

*Evaporation Materials : Crucible, Pellets,Granules,Pieces,etc

*Backing Plate: Cu, Mo, SS,etc

*Bonding Service: Indium, Elastomer     


Pure Chromium Metal Chromium Sputter/Sputtering Target

OUR ADVANTAGE

1,Many years manufacturing & exporting experience.

2 Strict & complete QC systerm

3,Perfect after sale systerm     

Pure Chromium Metal Chromium Sputter/Sputtering Target

PRODUCTION PROCESS

Vacuum electron beam furnace, vacuum induction melting furnace, forging machine, rolling mill, oil press,

vacuum annealing furnace, numerical control lathe, numerical control milling machine, machining center, 

grinding machine, wire cutting, numerical control water cutting, XRF, icp-oes, metallographic detector, etc

Pure Chromium Metal Chromium Sputter/Sputtering Target
 
Our Quality Control System

Pure Chromium Metal Chromium Sputter/Sputtering Target

Our Certificates

1. We are an ISO9001 certified company.

2. We've been issued SGS Report.

3. We've been  awarded as a High-Tech Enterprise.

4. We've been invested by the National Fund for High-end Equipment. 

Pure Chromium Metal Chromium Sputter/Sputtering Target

Our Exhibition

We have been attended exhibitions in Korea, Japan, USA, German, etc.

Pure Chromium Metal Chromium Sputter/Sputtering Target

Application

Magnetic data storage/ Solar photovoltaic/ Glass coating 

Semi-conductor/ Flat panel display/ Decoration coating

Pure Chromium Metal Chromium Sputter/Sputtering Target

Our Products

We can also produce other metal sputtering targets, evaporation materials, crucibles, compound sputtering targets, etc.

We warmly welcome our dear customers from all around the world with OEM&ODM service.

Pure Chromium Metal Chromium Sputter/Sputtering Target
                                                                       

Our Team

1. We've been providing high-quality products & service for many years. 

2. The factory covers an area of 2,000 square meter.

3. We have over 30 employees, including a group of experts in non-ferrous industry. 

4. We have a professional team foreign trade. 

Pure Chromium Metal Chromium Sputter/Sputtering Target
                                                

Contact Information

You can also contact us at christyatxk-sputteringtarget.com

We will reply to you within 24 hours.



Pure Chromium Metal Chromium Sputter/Sputtering Target

Contact us

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